Simple, intuitive GUI:

The main control interface for the Metallifier sputter coater gives full but safety-interlocked control over the sputter system; valves can be controlled individually, but will not operate if this will compromise system integrity. Graphical display of the shutter state means that even when manually controlled there is no confusion over which sample is under which magnetron, a common source of errors in a research environment. Report generation from a built-in database provides comprehensive information about each sputter process. The recipe editor interface allows deposition of any number of layers onto samples in any order. Up to six 4” wafers can be loaded in a single run, with up to four different target materials. A built-in material database holds density and acoustic impedance information for a wide range of target materials, with the ability to add custom materials. In combination with the film thickness monitor this allows film thickness driven recipes; recipes can also be driven more conventionally by time.

Versatile equipment for research and test laboratories